Tailored plasma-density profiles for enhanced energy extraction in passive plasma beam dumps
نویسندگان
چکیده
منابع مشابه
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As microelectronic device features continue to shrink approaching atomic dimensions, control of the ion energy distribution on the substrate during plasma etching and deposition becomes increasingly critical. The ion energy should be high enough to drive ion-assisted etching, but not too high to cause substrate damage or loss of selectivity. In many cases, a nearly monoenergetic ion energy dist...
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ژورنال
عنوان ژورنال: Plasma Physics and Controlled Fusion
سال: 2019
ISSN: 0741-3335,1361-6587
DOI: 10.1088/1361-6587/ab4cfb